DOCK 20, Druckwerk and S-MAK are organizing a joint residency entitled “Between Pattern and Memory”, which aims to explore the collection, history and present of Vorarlberg embroidery.
At the newly opened S-MAK, embroidery is not only understood as a textile product, but also as a cultural practice – as an interplay of design, technology, work and global interdependencies. The residency invites visitors to explore these levels through research, art and design and to translate them into contemporary formats.
Content and tasks
Lustenau’s identity has been closely linked to embroidery for over 250 years. The residency provides for active work with the S-MAK collection. The participants choose a clearly defined collection or thematic complex and develop an independent research question from it.
Expected
- Inspection and interpretation of archive and collection material
- Development of an independent approach
- Implementation in a contemporary form (artistic, theoretical, creative or hybrid)
The residency is research-based. Results can be process-based or fragmentary (e.g. works, texts, essays, prototypes, installative or performative formats). A public presentation is planned.
Target group
Artists, designers, theorists, cultural scientists, social scientists and humanities scholars with an interest in textiles, design history, material culture or archival work. Interdisciplinary approaches are expressly encouraged.
Facts
Application deadline: April 30, 2026
Duration: 4 weeks (October 1 – 31, 2026, by arrangement)
Location: Lustenau (S-MAK, Druckwerk)
Fee: € 1,500 + € 500 material budget per scholarship holder, travel expenses by arrangement
Application:
A PDF file (max. 10 pages, 10 MB) with letter of motivation incl. project idea (1 page each), CV and portfolio
Submission by April 30, 2026 to:
Application deadline: April 30, 2026